The Library
Wave function-dependent mobility and suppression of interface roughness scattering in a strained SiGe p-channel field-effect structure
Tools
Sadeghzadeh, Mohammad Ali, Horrell, A. I., Mironov, O. A., Parker, Evan H. C., Whall, Terry E. and Kearney, M. J. (2000) Wave function-dependent mobility and suppression of interface roughness scattering in a strained SiGe p-channel field-effect structure. Applied Physics Letters, Vol.76 (No.18). pp. 2568-2570. doi:10.1063/1.126410 ISSN 0003-6951.
|
PDF
WRAP_Sadeghzadeh_wave_function.pdf - Requires a PDF viewer. Download (118Kb) |
Official URL: http://dx.doi.org/10.1063/1.126410
Abstract
The 4 K Hall mobility has been measured in a top-gated, inverted, modulation-doped Si/Si0.8Ge0.2 structure having a Si:B doping layer beneath the alloy. From comparisons with theoretical calculations, we argue that, unlike an ordinary enhancement-mode SiGe p-channel metal–oxide–semiconductor structure, this configuration leads to a decrease of interface roughness scattering with increasing sheet carrier density. We also speculate on the nature of the interface charge observed in these structures at low temperature.
Item Type: | Journal Article | ||||
---|---|---|---|---|---|
Subjects: | T Technology > TK Electrical engineering. Electronics Nuclear engineering Q Science > QC Physics |
||||
Divisions: | Faculty of Science, Engineering and Medicine > Science > Physics | ||||
Library of Congress Subject Headings (LCSH): | Hall effect, Electron mobility, Semiconductors -- Junctions, Scattering (Physics), Germanium alloys, Silicon alloys | ||||
Journal or Publication Title: | Applied Physics Letters | ||||
Publisher: | American Institute of Physics | ||||
ISSN: | 0003-6951 | ||||
Official Date: | 1 March 2000 | ||||
Dates: |
|
||||
Volume: | Vol.76 | ||||
Number: | No.18 | ||||
Page Range: | pp. 2568-2570 | ||||
DOI: | 10.1063/1.126410 | ||||
Status: | Peer Reviewed | ||||
Access rights to Published version: | Open Access (Creative Commons) |
Request changes or add full text files to a record
Repository staff actions (login required)
View Item |