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Surface and subsurface oxide formation on Ni(100) and Ni(111)
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UNSPECIFIED (2004) Surface and subsurface oxide formation on Ni(100) and Ni(111). Surface Science, 565 (1). pp. 1-13. doi:10.1016/j.susc.2004.06.204 ISSN 0039-6028.
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Official URL: http://dx.doi.org/10.1016/j.susc.2004.06.204
Abstract
The oxidation of Ni(1 0 0) and Ni(1 1 1) at elevated temperatures and large oxygen exposures, typical of the methods used in the preparation of NiO(1 0 0) films for surface studies, has been investigated by medium energy ion scattering (MEIS) using 100 keV H+ incident ions. Oxide film growth proceeds significantly faster on Ni(1 1 1) than on Ni(1 0 0), but on both surfaces oxide penetration occurs to depths significantly greater than 100 A with total exposures of 1200 and 6000 L respectively. The metal/oxide interface is extremely rough, with metallic Ni extending to the surface, even for much thicker oxide films on Ni(1 1 1). On Ni(1 1 1), NiO growth occurs with the (1 0 0) face parallel to the Ni(1 1 1) surface and the close-packed (1 1 0) directions parallel. On Ni(1 0 0) the MEIS blocking curves cannot be reconciled with a single orientation of NiO(1 0 0) (with the <1 1 0> directions parallel) on the surface, but is consistent with the substantial orientational disorder (including tilt) previously identified by spot-profile analysis LEED. (C) 2004 Elsevier B.V. All rights reserved.
Item Type: | Journal Article | ||||
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Subjects: | Q Science > QD Chemistry Q Science > QC Physics |
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Journal or Publication Title: | Surface Science | ||||
Publisher: | ELSEVIER SCIENCE BV | ||||
ISSN: | 0039-6028 | ||||
Official Date: | 1 September 2004 | ||||
Dates: |
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Volume: | 565 | ||||
Number: | 1 | ||||
Number of Pages: | 13 | ||||
Page Range: | pp. 1-13 | ||||
DOI: | 10.1016/j.susc.2004.06.204 | ||||
Publication Status: | Published |
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