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Modelling and parametric optimisation of deposited layer thickness in electric discharge coating process
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Das, Abhishek and Misra, J. P. (2016) Modelling and parametric optimisation of deposited layer thickness in electric discharge coating process. International Journal of Surface Science and Engineering, 10 (3). pp. 253-271. doi:10.1504/IJSURFSE.2016.076997 ISSN 1749-785X.
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Official URL: https://doi.org/10.1504/IJSURFSE.2016.076997
Abstract
Electric discharge coating (EDC) process is used for producing coating of hard carbides on worksurface through chemical reaction of transferred tool electrode material and the carbon decomposed from the dielectric at high temperature. This paper presents the modelling of deposited layer thickness in EDC using response surface methodology (RSM) and artificial neural network (ANN). Four factors, three levels Box-Behnken design of RSM has been designed to carry out the experimentation. The experimental outcomes are used to train the ANN model. A comparative study has been carried out to evaluate the performance of both the modelling techniques. Parametric optimisation of the process has been carried out using genetic algorithm (GA). Confirmation experiment has also been carried out to validate the analytical study.
Item Type: | Journal Article | ||||||
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Subjects: | T Technology > TJ Mechanical engineering and machinery T Technology > TS Manufactures |
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Divisions: | Faculty of Science, Engineering and Medicine > Engineering > WMG (Formerly the Warwick Manufacturing Group) | ||||||
Journal or Publication Title: | International Journal of Surface Science and Engineering | ||||||
Publisher: | Interscience Publishers | ||||||
ISSN: | 1749-785X | ||||||
Official Date: | 17 June 2016 | ||||||
Dates: |
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Volume: | 10 | ||||||
Number: | 3 | ||||||
Page Range: | pp. 253-271 | ||||||
DOI: | 10.1504/IJSURFSE.2016.076997 | ||||||
Status: | Peer Reviewed | ||||||
Publication Status: | Published | ||||||
Access rights to Published version: | Restricted or Subscription Access | ||||||
Date of first compliant deposit: | 1 August 2019 |
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