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Design and modelling of a generic compliant mechanism with bi-stability and static balancing

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Zhu, Jiaxiang, Hao, Guangbo and Tang, Hui (2022) Design and modelling of a generic compliant mechanism with bi-stability and static balancing. In: IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO), Tianjin, China, 08-12 Aug 2022. Published in: 2022 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO) pp. 172-177. ISBN 9781665475440. doi:10.1109/3m-nano56083.2022.9941512 ISSN 2373-5422.

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Official URL: https://doi.org/10.1109/3m-nano56083.2022.9941675

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Abstract

This article presents two new compliant mechanisms that are able to achieve bi-stability and static balancing where the improved motion characteristics and reduced footprint can be obtained. One design is a single-layer symmetrical design, and the other design is a two-layer compact design. Static balancing is accomplished by adjusting the initial slope of the beam embodied in the bistable mechanism. The free-body diagram (FBD) combined with the beam constraint model (BCM) method is employed to capture the nonlinearities in the force-displacement characteristics of the proposed compliant bistable mechanism. Nonlinear Finite element analysis (FEA) is carried out to verify the modelling results.

Item Type: Conference Item (Paper)
Divisions: Faculty of Science, Engineering and Medicine > Engineering > Engineering
SWORD Depositor: Library Publications Router
Journal or Publication Title: 2022 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)
Publisher: IEEE
ISBN: 9781665475440
ISSN: 2373-5422
Official Date: 16 November 2022
Dates:
DateEvent
16 November 2022Published
1 July 2022Accepted
Page Range: pp. 172-177
DOI: 10.1109/3m-nano56083.2022.9941512
Status: Peer Reviewed
Publication Status: Published
Reuse Statement (publisher, data, author rights): © 2022 IEEE.  Personal use of this material is permitted.  Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.
Access rights to Published version: Restricted or Subscription Access
Copyright Holders: IEEE
RIOXX Funder/Project Grant:
Project/Grant IDRIOXX Funder NameFunder ID
202008300013China Scholarship Councilhttp://dx.doi.org/10.13039/501100004543
Conference Paper Type: Paper
Title of Event: IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)
Type of Event: Conference
Location of Event: Tianjin, China
Date(s) of Event: 08-12 Aug 2022
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