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A PHOTOELECTRON DIFFRACTION STUDY OF THE STRUCTURE OF PF3 ADSORBED ON NI(111)
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UNSPECIFIED (1992) A PHOTOELECTRON DIFFRACTION STUDY OF THE STRUCTURE OF PF3 ADSORBED ON NI(111). CHEMICAL PHYSICS LETTERS, 199 (6). pp. 625-630. ISSN 0009-2614.
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Abstract
The technique of scanned energy photoelectron diffraction has been used to study the structure PF3 adsorbed on a Ni{111} surface. The molecule adsorbs in an atop site with a Ni-P separation of 2.07 (+/- 0.03) angstrom and gives rise to an expansion of the Ni-Ni outermost layer spacing of 0.03 (+/- 0.05) angstrom.
Item Type: | Journal Article | ||||
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Subjects: | Q Science > QD Chemistry Q Science > QC Physics |
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Journal or Publication Title: | CHEMICAL PHYSICS LETTERS | ||||
Publisher: | ELSEVIER SCIENCE BV | ||||
ISSN: | 0009-2614 | ||||
Official Date: | 20 November 1992 | ||||
Dates: |
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Volume: | 199 | ||||
Number: | 6 | ||||
Number of Pages: | 6 | ||||
Page Range: | pp. 625-630 | ||||
Publication Status: | Published |
Data sourced from Thomson Reuters' Web of Knowledge
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