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SYNTHESIS OF OXIDES IN SI05GE05 ALLOY BY HIGH-DOSE OXYGEN ION-IMPLANTATION
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UNSPECIFIED (1992) SYNTHESIS OF OXIDES IN SI05GE05 ALLOY BY HIGH-DOSE OXYGEN ION-IMPLANTATION. In: SYMP AT THE 1991 SPRING MEETING OF THE EUROPEAN MATERIALS RESEARCH SOC : ION BEAM SYNTHESIS OF COMPOUND AND ELEMENTAL LAYERS, STRASBOURG, FRANCE, MAY 28-31, 1991. Published in: MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 12 (1-2). pp. 199-203. ISSN 0921-5107.
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Abstract
A Si0.5Ge0.5 alloy layer was implanted at a temperature of about 500-degrees-C with doses of 0.6 x 10(18), 1.2 x 10(18) and 1.8 x 10(18) O+ cm-2 at an energy of 200 keV. The alloy layer was prepared by molecular beam epitaxy (MBE), with an 800 nm thick film of Si0.5Ge0.5 alloy followed by a 75 nm thick top silicon layer grown on an n-type Si(100) (rho = 5-20 OMEGA cm) substrate. X-ray photoelectron spectroscopy measurements and Rutherford backscattering indicated that Si-O and Ge-O compounds were formed during the oxygen bombardment. The sample implanted with a dose of 1.8 x 10(18) O+ cm-2 was annealed at a temperature of 1000-degrees-C, which caused further growth of the SiO2 phase with a concomitant reduction in the oxides of germanium and rejection of germanium from the synthesis layer. The different oxidation rates for silicon and germanium can be attributed to thermodynamic effects.
Item Type: | Conference Item (UNSPECIFIED) | ||||
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Subjects: | T Technology > TA Engineering (General). Civil engineering (General) Q Science > QC Physics |
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Journal or Publication Title: | MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | ||||
Publisher: | ELSEVIER SCIENCE SA LAUSANNE | ||||
ISSN: | 0921-5107 | ||||
Official Date: | 20 January 1992 | ||||
Dates: |
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Volume: | 12 | ||||
Number: | 1-2 | ||||
Number of Pages: | 5 | ||||
Page Range: | pp. 199-203 | ||||
Publication Status: | Published | ||||
Title of Event: | SYMP AT THE 1991 SPRING MEETING OF THE EUROPEAN MATERIALS RESEARCH SOC : ION BEAM SYNTHESIS OF COMPOUND AND ELEMENTAL LAYERS | ||||
Location of Event: | STRASBOURG, FRANCE | ||||
Date(s) of Event: | MAY 28-31, 1991 |
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