The Library
BEHAVIOR OF HIGH-DOSE O+-IMPLANTED SI/GE/SI STRUCTURES
Tools
UNSPECIFIED (1990) BEHAVIOR OF HIGH-DOSE O+-IMPLANTED SI/GE/SI STRUCTURES. APPLIED PHYSICS LETTERS, 57 (9). pp. 890-892. ISSN 0003-6951.
Research output not available from this repository.
Request-a-Copy directly from author or use local Library Get it For Me service.
Item Type: | Journal Article | ||||
---|---|---|---|---|---|
Subjects: | Q Science > QC Physics | ||||
Journal or Publication Title: | APPLIED PHYSICS LETTERS | ||||
Publisher: | AMER INST PHYSICS | ||||
ISSN: | 0003-6951 | ||||
Official Date: | 27 August 1990 | ||||
Dates: |
|
||||
Volume: | 57 | ||||
Number: | 9 | ||||
Number of Pages: | 3 | ||||
Page Range: | pp. 890-892 | ||||
Publication Status: | Published |
Data sourced from Thomson Reuters' Web of Knowledge
Request changes or add full text files to a record
Repository staff actions (login required)
View Item |