The Library
Evaluation of relaxation and misfit dislocation blocking in strained silicon on virtual substrates
Tools
Parsons, J., Beer, C. S., Leadley, D. R. (David R.), Capewell, Adam Daniel and Grasby, T. J. (2008) Evaluation of relaxation and misfit dislocation blocking in strained silicon on virtual substrates. Thin Solid Films, Vol.517 (No.1). pp. 17-19. doi:10.1016/j.tsf.2008.08.026 ISSN 0040-6090.
Research output not available from this repository.
Request-a-Copy directly from author or use local Library Get it For Me service.
Official URL: http://dx.doi.org/10.1016/j.tsf.2008.08.026
Abstract
Relaxation of strained silicon on 20% linear graded virtual substrates has been quantified using a dilute Schimmel etchant to reveal dislocation content, and high-resolution X-ray diffraction. The thickness of strained silicon investigated ranged from 10-180 nm. Low levels of relaxation were observed in layers below the Matthews and Blakeslee critical thickness, increasing up to about 2% relaxation for the largest layer thickness. Stacking faults were observed in all but the 10 nm layer, as confirmed by cross-sectional transmission electron microscopy. Impediments to dislocation glide by misfit dislocations and stacking faults were quantified and offered as an explanation for the limited degree of relaxation observed. (c) 2008 Published by Elsevier B.V.
Item Type: | Journal Article | ||||
---|---|---|---|---|---|
Subjects: | Q Science > QC Physics T Technology > TA Engineering (General). Civil engineering (General) |
||||
Divisions: | Faculty of Science, Engineering and Medicine > Science > Physics | ||||
Library of Congress Subject Headings (LCSH): | Silicon, Thin films, Deformations (Mechanics), Relaxation phenomena | ||||
Journal or Publication Title: | Thin Solid Films | ||||
Publisher: | Elsevier S.A. | ||||
ISSN: | 0040-6090 | ||||
Official Date: | 3 November 2008 | ||||
Dates: |
|
||||
Volume: | Vol.517 | ||||
Number: | No.1 | ||||
Number of Pages: | 3 | ||||
Page Range: | pp. 17-19 | ||||
DOI: | 10.1016/j.tsf.2008.08.026 | ||||
Status: | Peer Reviewed | ||||
Publication Status: | Published |
Data sourced from Thomson Reuters' Web of Knowledge
Request changes or add full text files to a record
Repository staff actions (login required)
View Item |