Characterization of 4H-SiC PiN diodes formed on defects identified by PL imaging

Research output not available from this repository.

Request-a-Copy directly from author or use local Library Get it For Me service.

Request Changes to record.

Abstract

In this paper the results of a study in which the surface quality of 30, 35 and 110 µm 4H-SiC epitaxial layers from different manufacturers are evaluated using AFM and photoluminescence (PL) imaging. PiN diodes are then intentionally fabricated on triangular defects and polytypes grains which are formed, in order to understand their impact on the resulting electrical characteristics, which includes on-state behaviour, turn-on characteristics and reverse leakage current behaviour. The results indicate that the defects form a high resistance short through the p-type anode. This results in higher leakage current, well over 108 times higher than the devices formed off-defect. PiN diodes fabricated on-defect also suffered from soft breakdown unlike those off-defect.

Item Type: Journal Article
Divisions: Faculty of Science, Engineering and Medicine > Engineering > Engineering
SWORD Depositor: Library Publications Router
Journal or Publication Title: Materials Science Forum
Publisher: Trans Tech Publications
ISSN: 1662-9752
Official Date: 24 May 2016
Dates:
Date
Event
24 May 2016
Published
2 January 2016
Accepted
Volume: 858
Page Range: pp. 405-409
DOI: 10.4028/www.scientific.net/msf.858.405
Status: Peer Reviewed
Publication Status: Published
Access rights to Published version: Restricted or Subscription Access
URI: https://wrap.warwick.ac.uk/102096/

Export / Share Citation


Request changes or add full text files to a record

Repository staff actions (login required)

View Item View Item