Number of items: 2.
2019
Vavasour, Oliver J., Jefferies, Richard, Walker, Marc, Roberts, Joseph W., Meakin, Naomi R., Gammon, P. M., Chalker, Paul R and Ashley, Tim
(2019)
Data for Effect of HCl cleaning on InSb–Al2O3 MOS capacitors.
[Dataset]
Vavasour, Oliver J., Jefferies, Richard, Walker, Marc, Roberts, Joseph W., Meakin, Naomi R., Gammon, P. M., Chalker, Paul R and Ashley, Tim
(2019)
Effect of HCl cleaning on InSb–Al2O3 MOS capacitors.
Semiconductor Science and Technology, 34
(3).
035032.
doi:10.1088/1361-6641/ab0331
ISSN 0268-1242.
This list was generated on Wed Dec 6 14:16:48 2023 GMT.
